关键词: 粗糙表面, 化学机械抛光, 抛光液, 微尺度流动, 稳定平台 差动绳传动 运动学 动力传递 有向图法

Abstract: Further development of ultra-large-scale integration (ULSI) is restricted by the state-of-the-art of the planarization technology due to the further micronization of the characteristic line width. Flow property of the polishing slurry is one of the important factors influencing the efficiency and performance of the planarization process. It is verified in practice that the grooved pad will enhance the transport of the slurry to and from the wafer center. The microscale flow of polishing slurry on the multilevel rough surface of grooved pad is taken as a study object. The simulated production technique is used to generate the multilevel rough surface, and a new computational fluid dynamic method, Lattice Boltzmann method (LBM), is used to analyze the flow of slurry in the multilevel rough gap. The flow characteristic of the slurry on the multilevel rough surface and the effect of pad topography on the flow of slurry are studied preliminarily. The results show that the present method can be used to analyze the effect of the geometrical parameters of pad on the transport of the polishing slurry and possesses good statistical property. The theoretical research method developed is helpful to the design and manufacture of a new generation pad and also to the pad conditioning.

Key words: Chemical mechanical polishing, Microscale flow, Polishing slurry, Rough surface