• CN:11-2187/TH
  • ISSN:0577-6686

机械工程学报 ›› 2019, Vol. 55 ›› Issue (16): 77-84.doi: 10.3901/JME.2019.16.077

• 材料科学与工程 • 上一篇    下一篇

Ti2AlN薄膜的制备及性能表征

刘可心1, 王蕾2, 刘佳磊3, 金松哲3   

  1. 1. 东北电力大学工程训练教学中心 吉林 132012;
    2. 长春理工大学光电信息学院机电工程分院 长春 130012;
    3. 长春工业大学先进结构材料省部共建教育部重点试验室 长春 130012
  • 收稿日期:2018-09-06 修回日期:2019-04-16 出版日期:2019-08-20 发布日期:2019-08-20
  • 通讯作者: 金松哲(通信作者),男,1965年出生,工学博士,教授。主要研究方向为高性能复合材料。E-mail:szjin@126.com
  • 作者简介:刘可心,男,1984年出生,工学硕士,实验师。主要研究方向为涂层材料、三元导电陶瓷。E-mail:liukexin19841004@126.com
  • 基金资助:
    吉林省科技支撑计划重大科技攻关招标资助项目(201302024004GX)。

Preparation and Characterization of Ti2AlN Films

LIU Kexin1, WANG Lei2, LIU Jialei3, JIN Songzhe3   

  1. 1. School of Engineering Training Center, Northeast Dianli University, Jilin 132012;
    2. College of Optical and Electrical Information, Changchun University of Science and Technology, Changchun 130012;
    3. Advanced Structural Materials of Ministry of Education Key Laboratory, Changchun University of Technology, Changchun 130012
  • Received:2018-09-06 Revised:2019-04-16 Online:2019-08-20 Published:2019-08-20

摘要: 三元氮化物Ti2AlN因其优良的性能而广泛被科研工作者所关注,但对Ti2AlN薄膜材料的制备及性能研究较少。采用多弧离子镀技术和真空退火工艺制备Ti2AlN薄膜,同时对薄膜的耐腐蚀性和高温抗氧化性进行测试及机理分析。试验结果及分析表明:在优化制备工艺下可以制备出耐腐蚀性和抗高温氧化性较好的Ti2AlN薄膜,与TiN薄膜进行耐腐蚀性能对比,发现Ti2AlN薄膜具有更加优良的耐腐蚀性能;与TiN薄膜抗高温氧化温度极限值550℃相比,Ti2AlN薄膜在800℃高温时仍具有明显的抗氧化性能,Ti2AlN薄膜在高温时表面生成具有致密连续性的Al2O3氧化物,使其具有优于TiN薄膜的抗氧化性能,当超过800℃时,基体和氧化层之间产生较大应力差而导致氧化层的脱落和剥离。采用多弧离子镀技术和真空退火工艺可制备出耐腐蚀性和高温抗氧化性优良的Ti2AlN薄膜,可为Ti2AlN薄膜的研究提供理论支撑。

关键词: 减阻率, 接触角, 摩擦阻力系数, 疏水性微肋阵, 压力降, Ti2AlN薄膜, 多弧离子镀, 抗高温氧化性能, 正交试验

Abstract: Ti2AlN has been focused by many researchers for its excellent properties, however, the research on fabrication and properties of the Ti2AlN film is little. Multi-arc ion plating and subsequent vacuum annealing are used to prepare the Ti2AlN film, and the corrosion resistance and high temperature oxidation resistance of the film are tested and analyzed. The results show that the Ti2AlN film which possessed better corrosion resistance and high temperature oxidation resistance compared with TiN film can be obtained under the optimized process. The anti-oxidation limit of Ti2AlN film is 800℃ compared with 500℃ of TiN film, the continuous and dense Al2O3 formed on the surface of Ti2AlN film is the main reason for higher anti-oxidation property. The larger thermal stress between the substrate and the oxide layer when the temperature exceeded 800℃ accelerate the stripping of the oxide layer. Ti2AlN film with excellent corrosion resistance and high temperature oxidation resistance could be fabricated by multi-arc ion plating and vacuum annealing process, which can provide the theoretical support for the study of Ti2AlN film.

Key words: contact angle, friction resistance coefficient, pressure drop, resistance reduction rate, hydrophobic micro pin fins, high temperature oxidation resistance, multi-arc ion plating, orthogonal test, Ti2AlN films

中图分类号: