纳米厚度光刻胶多次刮刀涂布工艺分析

doi:10.3901/JME.260704

机械工程学报 ›› 2026, Vol. 62 ›› Issue (13): 410-417.doi: 10.3901/JME.260704

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纳米厚度光刻胶多次刮刀涂布工艺分析

李禹泽, 闫英, 何涛, 李涵, 李贺男, 万佳奇, 方子铿, 郭东明

大连理工大学高性能精密制造全国重点实验室大连 116024

收稿日期:2025-07-06 修回日期:2026-02-13 发布日期:2026-08-28
作者简介:李禹泽，男，2001年出生。主要研究方向为薄膜制备。E-mail：liyuze@mail.dlut.edu.cn;闫英(通信作者)，女，1987年出生，博士，副教授，博士研究生导师。主要研究方向为超大口径光栅基底高效加工与纳米尺度缺陷无损检测、超大面积纳米级薄膜厚度均匀性高精度控制以及颗粒可控分布光源薄膜制备。E-mail：yanying@dlut.edu.cn
基金资助:
国家重点研发计划资助项目(2019YFA0709102,2020YFA0714502)。20250706收到初稿，20260213收到修改稿

Nanometer-scale Thickness Photoresist Multiple Blade Coating Process Analysis

LI Yuze, YAN Ying, HE Tao, LI Han, LI Henan, WAN Jiaqi, FANG Zikeng, GUO Dongming

National Key Laboratory of High Performance Precision Manufacturing, Dalian University of Technology, Dalian 116024

Received:2025-07-06 Revised:2026-02-13 Published:2026-08-28

摘要/Abstract

摘要： 纳米级厚度的光刻胶薄膜在微纳米加工领域，尤其是在半导体制造和微电子器件制造中应用广泛。针对光刻胶薄膜的制备方法，刮刀涂布法因其设备结构简单、溶液利用率高、涂布过程可控，且可适用于大尺寸或大长宽比基底而备受关注。然而，在实际刮涂过程中，单次刮涂仍存在膜厚值不理想及厚度不均匀等问题。为此，提出通过多次刮涂来提高涂布质量，并对不同刮涂次数进行单变量对比实验；同时，检测各组实验中光刻胶膜厚及不均匀性，并利用COMSOL软件对多次刮涂过程中膜厚减薄与均匀性提升的过程进行仿真分析。结果表明，光刻胶薄膜厚度随刮涂次数增加呈反比例函数下降，且多次刮涂可进一步提升薄膜均匀性。本研究为优化刮刀涂布制备光刻胶薄膜工艺提供了新的思路。

关键词: 纳米级厚度, 光刻胶薄膜, 多次刮刀涂布

Abstract: Photoresist films with nanometric thickness are widely applied in the field of micro-nanofabrication, particularly in semiconductor manufacturing and microelectronic device fabrication. Among various fabrication methods for photoresist films, the blade-coating technique has attracted considerable attention due to its simple equipment setup, high solution utilization rate, controllable coating process, and suitability for large or high-aspect-ratio substrates. However, single-pass blade-coating often fails to achieve the desired film thickness and uniformity. To address this issue, this study proposes a multiple-pass blade-coating approach to enhance coating quality. A series of single-variable experiments are carried out to compare the film thickness and non-uniformity under different coating passes, and COMSOL simulations are conducted to investigate how film thickness is gradually reduced and uniformity is improved during multiple passes. The results indicate that the photoresist film thickness decreases in an inverse-proportional manner with the increasing number of passes, and multiple-pass blade-coating further enhances film uniformity. This finding provides a novel strategy for optimizing the blade-coating process in photoresist film preparation.

Key words: nanometer thickness, photoresist film, multiple-blade coating

中图分类号:

TQ021

李禹泽, 闫英, 何涛, 李涵, 李贺男, 万佳奇, 方子铿, 郭东明. 纳米厚度光刻胶多次刮刀涂布工艺分析[J]. 机械工程学报, 2026, 62(13): 410-417.

LI Yuze, YAN Ying, HE Tao, LI Han, LI Henan, WAN Jiaqi, FANG Zikeng, GUO Dongming. Nanometer-scale Thickness Photoresist Multiple Blade Coating Process Analysis[J]. Journal of Mechanical Engineering, 2026, 62(13): 410-417.

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链接本文: http://www.cjmenet.com.cn/CN/10.3901/JME.260704

http://www.cjmenet.com.cn/CN/Y2026/V62/I13/410

参考文献

[1] 陈颖，黄润坤，吴頔，等. 全球光刻胶产业现状及布局[J]. 中国集成电路，2023，32(5)：22-26，65. CHEN Ying，HUANG Runkun，WU Di，et al. The current situation and layout of the photoresist industry[J]. Chinese Integrated Circuits，2023，32(5)：22-26，65.
[2] 刘巧云，祁秀秀，杨怡，等. 光刻胶材料的研究进展[J]. 微纳电子技术，2023，60(3)：378-384. LIU Qiaoyun，QI Xiuxiu，YANG Yi，et al. Research progress on photoresist materials[J]. Micro-nano Electronics，2023，60(3)：378-384.
[3] 简祺霞，王军，袁凯，等. 光刻工艺中关键流程参数分析[J]. 微处理机，2011，32(6)：14-17. JIAN Qixia，WANG Jun，YUAN Kai，et al. Anasysis of the key parameters in lithography process[J]. Microprocessors，2011，32(6)：14-17.
[4] XIAO Y，ZUO C，ZHONG J X，et al. Large-area blade-coated solar cells：Advances and perspectives[J]. Advanced Energy Materials，2021，11(21)：2100378.
[5] 李今朝，曹焕奇，张超，等. 气相辅助刮刀涂布法制备钙钛矿薄膜[J]. 中国光学， 2019，12(5)：1028-1039. LI Jinzhao，CAO Huanqi，ZHANG Chao，et al. Vapor assisted doctor blading process to fabricate perovskite thin films[J]. Chinese Journal of Optics，2019，12(5)：1028-1039.
[6] REN Y，ZHANG K，LIN Z，et al. Long-chain gemini surfactant-assisted blade coating enables large-area carbon-based perovskite solar modules with record performance[J]. Nano-Micro Letters，2023，15(1)：158.
[7] HE M，LI B，CUI X，et al. Meniscus-assisted solution printing of large-grained perovskite films for high-efficiency solar cells[J]. Nature Communications，2017，8(1)：16045.
[8] 毛帮笑，夏细胜，王大奎，等. 基于响应面法的SiO_2f/SiO₂复合材料多级防潮涂层工艺优化[J]. 航天制造技术，2023(3)：33-39. MAO Bangxiao，XIA Xisheng，WANG Dakui，et al. Optimization of multilevel moisture-proof coating process of SiO_2f/SiO₂ composites based on response surface method[J]. Aerospace Manufacturing Technology， 2023(3)：33-39.
[9] 张夏丽. 大面积并苯类有机小分子晶态薄膜的制备及其在场效应晶体管中的应用[D]. 苏州：苏州大学，2020. ZHANG Xiali. Fabrication of large-area crystalline thin films of soluble acene for organic field-effect transistors[D]. Soochow：Soochow University，2020.
[10] KUMBERG J，MÜLLER M，DIEHM R，et al. Drying of adhesion，and crack formation[J]. Energy Technology， 2019，7(11)：1900722.
[11] ZHANG Y S，COURTIER N E，ZHANG Z，et al. A review of lithium-ion battery electrode drying：Mechanisms and metrology[J]. Advanced Energy Materials，2022，12(2)：2102233.
[12] 刘玉青，林怀锋，于艳玲，等. 狭缝挤压式涂布质量密度流场演变与膜区形貌的闭环控制策略[J]. 储能科学与技术，2024，13(4)：1118-1127. LIU Yuqing，LIN Huaifeng，YU Yanling，et al. Closed-loop control strategy of mass-density flow field evolution and film morphology for slot die coating[J]. Energy Storage Science and Technology，2024，13(4)：1118-1127.
[13] SIEGRIST S，NANDI P，KOTHANDARAMAN R K，et al. Understanding coating thickness and uniformity of blade-coated SnO₂ electron transport layer for scalable perovskite solar cells[J]. Solar RRL，2023，7(14)：2300273.
[14] DENG Y，ZHENG X，BAI Y，et al. Surfactant-controlled ink drying enables high-speed deposition of perovskite films for efficient photovoltaic modules[J]. Nature Energy，2018，3(7)：560-566.
[15] DAI X，DENG Y，Van BRACKLE C H，et al. Meniscus fabrication of halide perovskite thin films at high throughput for large area and low-cost solar panels[J]. International Journal of Extreme Manufacturing，2019，1(2)：22004.
[16] 余宏伟. 刮涂薄膜质量调控及其在量子点发光器件应用研究[D]. 长春：吉林大学，2023. YU Hongwei. Quality control of blade-coated films and its application in quantum-dots light-emitting diodes[D]. Changchun：Jilin University，2023.
[17] 叶枝灿，徐东，王芸，等. 基于光刻胶回流特性的平面化工艺[J]. 微细加工技术，2005(4)：12-15，30. YE Zhican，XU Dong，WANG Yun，et al. A planarization process based on reflowing characteristic of photoresist[J]. Microfabrication Technology，2005(4)：12-15，30.
[18] KIRCHNER R，SCHIFT H. Thermal reflow of polymers for innovative and smart 3D structures：A review[J]. Materials Science in Semiconductor Processing，2019，92：58-72.
[19] CHOU Y T，KO Y T，YAN M F. Fluid flow model for ceramic tape casting.[J]. Journal of the American Ceramic Society，1987，70(10)：280-282.
[20] KIM H J，KRANE M J M，TRUMBLE K P，et al. Analytical fluid flow models for tape casting[J]. Journal of the American Ceramic Society，2006，89(9)：2769-2775.
[21] TSAI P，YU K，CHANG C，et al. Large-area organic solar cells by accelerated blade coating[J]. Organic Electronics，2015，22：166-172.

纳米厚度光刻胶多次刮刀涂布工艺分析

Nanometer-scale Thickness Photoresist Multiple Blade Coating Process Analysis

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