FeCrAl合金化学机械抛光粗糙度预测模型研究

doi:10.3901/JME.2023.23.310

摘要/Abstract

摘要： FeCrAl合金由于具有较好的抗辐照能力以及耐高温蒸汽腐蚀等优点，已成为事故容错材料包壳乃至第四代反应堆的重要候选材料之一。然而，在化学机械抛光过程中，FeCrAl合金表面晶界高差的出现影响了其表面粗糙度，难以获得超光滑表面。因此，为揭示FeCrAl合金晶界高差的形成和演化机理，建立了考虑晶界高差的化学机械抛光粗糙度预测模型。首先，计算了加工过程中单颗磨粒的材料去除体积及有效磨粒数量；随后，基于弹塑性接触理论，得到了任意两种晶向之间的晶界高差稳定值，并实现了对表面粗糙度稳定值S_a的预测；最后通过工艺实验对提出的预测模型进行了验证。结果表明：在加工后，基于预测模型计算的表面粗糙度稳定值与实验获得的表面粗糙度值变化趋势一致，模型误差在17%以内。基于预测模型对工艺参数进行优化后，最终表面粗糙度稳定值S_a降低至1.2 nm，获得了超光滑表面。

关键词: FeCrAl合金, 化学机械抛光, 粗糙度, 预测模型, 晶界高差

Abstract: FeCrAl alloy has become one of the most critical candidate materials used on accident-tolerant fuel (ATF) cladding and fourth-generation power reactors, which requires excellent irradiation resistance and anti-corrosion ability in high-temperature steam. However, it is difficult to achieve an ultra-smooth surface during chemical mechanical polishing (CMP) owing to the grain boundary step. Therefore, a roughness prediction model is established to clarify the formation and evolution mechanism of the grain boundary step. Firstly, the volume of material removal by a single abrasive and the number of effective abrasives are calculated during the process. Then, the stable grain boundary step between the grain orientations is obtained based on the elastic-plastic contact theory, and the prediction of stable roughness S_a is realized. Finally, experiments are conducted to validate the model. The results show that the trend of the calculation is consistent with stable surface roughness obtained by the experiments, and the error between them is within 17%. The parameters are optimized based on the prediction model, and an ultra-smooth surface is obtained with the stable surface roughness S_a 1.2 nm.

Key words: FeCrAl alloy, CMP, surface roughness, predictive model, grain boundary step

中图分类号:

TG175

郭江, 杨哲, 张鹏飞, 李琳光, 俞学雯, 潘博. FeCrAl合金化学机械抛光粗糙度预测模型研究[J]. 机械工程学报, 2023, 59(23): 310-319.

GUO Jiang, YANG Zhe, ZHANG Pengfei, LI Linguang, YU Xuewen, PAN Bo. Prediction of Surface Roughness in Chemical Mechanical Polishing of FeCrAl[J]. Journal of Mechanical Engineering, 2023, 59(23): 310-319.

导出引用管理器 EndNote|Reference Manager|ProCite|BibTeX|RefWorks

链接本文: http://www.cjmenet.com.cn/CN/10.3901/JME.2023.23.310

http://www.cjmenet.com.cn/CN/Y2023/V59/I23/310

参考文献

[1] HELLSTROM K，HALL J，MALMBERG P，et al. Mitigation of fireside corrosion in power plants:the combined effect of sulfur dioxide and potassium chloride on the corrosion of a FeCrAl alloy[J]. Energy & fuels，2014，28(9):6116-6129.
[2] 黄希，李小燕，方晓东，等. 容错事故燃料包壳用FeCrAl合金的研究进展[J]. 材料工程，2020，48(3):19-33. HUANG Xi，LI Xiaoyan，FANG Xiaodong，et al. Research progress in FeCrAl alloys for accident-tolerant fuel cladding[J]. Journal of Materials Engineering，2020，48(3):19-33.
[3] EJENSTAM J，HALVARSSON M，WEIDOW J，et al. Oxidation studies of Fe10CrAl–RE alloys exposed to Pb at 550℃ for 10000 h[J]. Journal of Nuclear Materials，2013，443(1-3):161-170.
[4] TERRANI K A，ZINKLE S J，SNEAD L L. Advanced oxidation-resistant iron-based alloys for LWR fuel cladding[J]. Journal of Nuclear Materials，2014，448(1-3):420-435.
[5] 周军，邱绍宇，杜沛南，等. 耐事故燃料包壳用FeCrAl不锈钢的研究进展[J]. 材料导报，2017，31(S2):47-51. ZHOU Jun，QIU Shaoyu，DU Peinan，et al. Research progress in the FeCrAl alloys for accident tolerant fuel cladding[J]. Materials Review，2017，31(S2):47-51.
[6] ROSS D，YAMAGUCHI H. Nanometer-scale characteristics of polycrystalline YAG ceramic polishing[J]. CIRP Annals，2018，67(1):349-352.
[7] SUZUKI H，OKADA M，NAMBA Y，et al. Superfinishing of polycrystalline YAG ceramic by nanodiamond slurry[J]. CIRP Annals，2019，68(1):361-364.
[8] GUO J，SHI X，SONG C，et al. Theoretical and experimental investigation of chemical mechanical polishing of W–Ni–Fe alloy[J]. International Journal of Extreme Manufacturing，2021，3(2):025103.
[9] MCKAY J M N. Chemical mechanical polishing and direct bonding of YAG and Y₂O₃[D]. Los Angeles:University of California，2016.
[10] HE Q. Experimental study on polishing performance of CeO₂ and nano-SiO₂ mixed abrasive[J]. Applied Nanoscience，2018，8(1):163-171.
[11] XU W，LU X，PAN G，et al. Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate[J]. Applied Surface Science，2010，256(12):3936-3940.
[12] AIDA H，DOI T，TAKEDA H，et al. Ultraprecision CMP for sapphire，GaN，and SiC for advanced optoelectronics materials[J]. Current Applied Physics，2012，12:S41-S46.
[13] ZHAO T，HU H，PENG X，et al. Study on the surface crystallization mechanism and inhibition method in the CMP process of aluminum alloy mirrors[J]. Applied Optics，2019，58(22):6091-6097.
[14] PRESTON F W. The theory and design of plate glass polishing machines[J]. Journal of Glass Technology，1927，11(44):214-256.
[15] RUNNELS S R，EYMAN L M. Tribology analysis of chemical-mechanical polishing[J]. Journal of the Electrochemical Society，1994，141(6):1698.
[16] ZHANG F，BUSNAINA A. The role of particle adhesion and surface deformation in chemical mechanical polishing processes[J]. Electrochemical and Solid-State Letters，1998，1(4):184.
[17] OUMA D O. Modeling of chemical mechanical polishing for dielectric planarization[D]. Cambridge:Massachusetts Institute of Technology，1998.
[18] TSAI H J，JENG Y R，HUANG P Y. An improved model considering elastic-plastic contact and partial hydrodynamic lubrication for chemical mechanical polishing[J]. Proceedings of the Institution of Mechanical Engineers，Part J:Journal of Engineering Tribology，2008，222(6):761-770.
[19] GREENWOOD J A，WILLIAMSON J B P. Contact of nominally flat surfaces[J]. Proceedings of the royal society of London. Series A. Mathematical and physical sciences，1966，295(1442):300-319.
[20] 袁巨龙，毛美姣，李敏，等. 基于响应曲面法的YG8硬质合金刀片化学机械抛光工艺参数优化[J]. 中国机械工程，2018，29(19):2290-2297. YUAN Julong，MAO Meijiao，LI Min，et al. Optimization of CMP processing parameters for YG8 cemented carbide inserts based on RSM[J]. China Mechanical Engineering，2018，29(19):2290-2297.
[21] ZHAO T，SHI Y Y，LIN X J，et al. Surface roughness prediction and parameters optimization in grinding and polishing process for IBR of aero-engine[J]. The International Journal of Advanced Manufacturing Technology，2014，74(5-8):653-663.
[22] 刘海旭，武庆东，曹潇俊，等. 基于响应曲面法的304不锈钢化学机械抛光工艺参数优化[J]. 金刚石与磨料磨具工程，2021，41(2):89-95. LIU Haixu，WU Qingdong，CAO Xiaojun，et al. Optimization of process parameters for chemical mechanical polishing of 304 stainless steel based on response surface method[J]. Diamond and Abrasive Engineering，2021，41(2):89-95.
[23] 王海全，付源政，高航，等. 磨粒流抛光粗糙度预测模型研究[J]. 机械工程学报，2022，58(15):188-197. WANG Haiquan，FU Yuanzheng，GAO Hang，et al. Study on prediction of surface roughness for abrasive flow machining[J]. Journal of Mechanical Engineering，2022，58(15):188-197.
[24] ISO 25178-2. Geometrical product specifications (GPS)—Surface texture:Areal—Part 2:Terms，definitions and surface texture parameters[S]. Geneva:ISO，2012.
[25] ZHAO Y，CHANG L. A micro-contact and wear model for chemical–mechanical polishing of silicon wafers[J]. Wear，2002，252(3-4):220-226.
[26] POPOV V L. Contact mechanics and friction[M]. Berlin:Springer Berlin Heidelberg，2010.
[27] ZHAO Y，MAIETTA D M，CHANG L. An asperity microcontact model incorporating the transition from elastic deformation to fully plastic flow[J]. Journal of Tribology，2000，122(1):86-93.
[28] QIN K，MOUDGIL B，PARK C W. A chemical mechanical polishing model incorporating both the chemical and mechanical effects[J]. Thin Solid Films，2004，446(2):277-286.
[29] JOHNSON K L. Contact mechanics[M]. Cambridge:Cambridge University Press，1987.
[30] El-KAREH B，HUTTER L N. Fundamentals of semiconductor processing technology[M]. Singapore:Springer Science & Business Media，2012.