• CN:11-2187/TH
  • ISSN:0577-6686

›› 2002, Vol. 38 ›› Issue (12): 98-102.

• 论文 • 上一篇    下一篇

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模具曲面抛光时表面去除的建模与试验研究

张雷;袁楚明;周祖德;陈幼平;郑力   

  1. 清华大学精密仪器与机械学系;华中科技大学;清华大学
  • 发布日期:2002-12-15

MODELING AND EXPERIMENT OF MATERIAL REMOVAL IN POLISHING ON MOLD CURVED SURFACES

Zhang Lei;Yuan Chuming;Zhou Zude;Chen Youping;Zheng Li   

  1. Tsinghua University Huazhong University of Science and Technology
  • Published:2002-12-15

摘要: 提出用表面去除廓形来描述模具表面在垂直于抛光轨迹方向的抛光去除量。在假设抛光工具与模具自由曲面的接触服从椭圆赫兹接触的前提下,利用提出的抛光去除系数推导了表面去除廓形的理论方程。仿真和试验结果揭示了抛光表面去除的规律,验证了表面去除廓形的理论模型。

关键词: 表面去除, 模具曲面, 抛光, 椭圆赫兹接触

Abstract: Material removal profile is proposed to describe the depth of material removal orthogonal to the tool path on a mold surface. Assuming that the contact between the tool and the mold free-form surface is the elliptical Hertzian contact, the theoretical equation of the material removal profile is derived based on the presented material removal coefficient. The experimental results agree well with the simulation predictions, which reveals the regularities of material removal and verifies the theoretical model of the material removal profile.

Key words: Material removal, Elliptical Hertzian contact, Polishing, Mold curved surface

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