• CN：11-2187/TH
  • ISSN：0577-6686
机械工程学报

›› 1991, Vol. 27 ›› Issue (1): 72-76.

• 论文 • 上一篇    下一篇

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离子束增强沉积Si3N4膜的显微组织结构分析

金祖卿;常明;许守廉;柳襄怀;郑志宏   

  1. 天津大学机电分校;上海冶金研究所
  • 发布日期:1991-01-01

ANALYSES OF THE MICROSTRUCTURES OF Si3N4 FILM BY ION BEAM ENHANCED DEPOSITION

Jin Zuqing;Chang Ming;Xu Shoulian;Liu Xianghuai;Zheng Shihong   

  1. The Mechanical & Electrical College under Tianjin University Shanghai Institute of Metallurgy
  • Published:1991-01-01

摘要： 本文使用TEM、SEM和χ射线物相分析等方法，分析研究了在1Cr18Ni9Ti不锈钢表面离子束增强沉积Si3N4膜的显微组织结构。研究表明，Si3N4膜为非晶态，膜内还存在少量弥散分布的晶态Si3N4相。对Si3N4的形貌、Si3N4/1Cr18Ni9Ti界面以及影响因素作了定性的分析讨论。

关键词: 沉积, 离子束, 显微组织

Abstract: TEM, SEM and x-ray have been used to investigate the microstructures of the silicon nitride film by Ion Beam Enhanced Deposition (IBED) on surface of 1 Cr18Ni9Ti. Observation reveals that Si3N4 is the amorphous structure and have been a little dispersed single crystal phase β–Si3N4 in the film. The physiognomy of Si3N4, interface shape of Si3N4/1Cr18Ni8Ti and the factors influence on the formation were discussed gualilatively in the paper.

Key words: 沉积, 离子束, 显微组织

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