关键词: CdZnTe, 化学机械抛光, 纳米球抛光液, 软脆功能晶体

Abstract: With a novel abrasive, mechanical polishing and chemical mechanical polishing method, α Al2O3 abrasive with diameter of 2-5 μm and self-developed nanosphere polishing slurry with diameter of 5 nm are respectively employed to lap and polish the Cd0.9Zn0.1Te(111), Cd0.96Zn0.04Te(110) and Cd0.96Zn0.04Te(111) single crystalline sheet. For comparison, the traditional machining method of abrasive, mechanical polishing and chemical corrosion is also used to machine the Cd0.96Zn0.04Te(111) single crystalline sheet. The results show that there are a lot of corrosion ditches, embedded hard particles and bigger scratches existing on the surface of Cd0.96Zn0.04Te(111) single crystalline sheet. While, after the polishing of novel method, the surface of Cd0.9Zn0.1Te(111) is very smooth and has no machining defects, that of Cd0.96Zn0.04Te(110) has shallow corrosion pits and slight scratches and no embedded particles, and the surface of Cd0.96Zn0.04Te(111) is also smooth and has only very slight and small scratches. The surface roughness Ra of Cd0.9Zn0.1Te(111), Cd0.96Zn0.04Te(110) and Cd0.96Zn0.04Te(111) single crystalline sheets after chemical mechanical polishing is respectively 2.196 nm, 3.145 nm and 3.499 nm.

Key words: CdZnTe, Chemical mechanical polishing, Nanosphere polishing slurry, Soft brittle crystalline