• CN:11-2187/TH
  • ISSN:0577-6686

›› 2013, Vol. 49 ›› Issue (7): 13-20.

• 论文 • 上一篇    下一篇

扫码分享

节省光刻胶的超声雾化喷涂工艺雾锥特性研究

向东;瞿德刚;牟鹏;王汉;刘楠   

  1. 清华大学精密仪器与机械学系;后勤工程学院军事供油工程系
  • 发布日期:2013-04-05

Research on the Spray Cone’s Characteristics of the Photoresist Saving-oriented Ultrasonic Atomizing Spraying Process

XIANG Dong;QU Degang;MOU Peng;WANG Han;LIU Nan   

  1. Department of Precision Instruments and Mechanology, Tsinghua University Department of Oil Supply Engineering, Logistical Engineering University
  • Published:2013-04-05

摘要: 光刻胶在集成电路(Integrated circuit, IC)制造、微机电系统(Micro electro-mechanical systems, MEMS)等工艺中广泛使用,价格昂贵、有毒。由于传统光刻胶薄膜制备多采用旋涂工艺,约95%的光刻胶浪费,且无害化处置成本高。为此,提高光刻胶的利用率一直是涂胶工艺追逐的目标之一。针对节省光刻胶的超声雾化喷涂薄膜制备工艺面临的薄膜均匀性问题,在自行开发的100 kHz的超声雾化喷嘴的基础上,通过分析载气的流场分布,建立雾化液滴在旋转、对称载气流场中的受力模型和碰撞模型,提出超声雾化液滴输运的数值模拟计算流程。超声雾化液滴输运的数值模拟有效地描述了供气流量、供液流量以及雾锥截面高度对雾锥液滴粒径和液滴浓度分布的影响。利用对AZ4999光刻胶雾锥特性的分析,在满足喷涂生产率的前提下,进行304.8 mm晶圆实际喷涂试验。试验结果表明超声雾化喷嘴不仅能够有效地实现光刻胶薄膜制备均匀性,而且较旋涂工艺节约80%以上的光刻胶,光刻胶利用率高。

关键词: 超声雾化喷嘴, 喷涂工艺, 雾锥特性, 液滴输运

Abstract: The photoresist is widely used in integrated circuit and micro electro-mechanical manufacturing systems processes, but traditional spin coating process will loss 95% of photoresist and cause negative environment impact for its high toxicity, which need higher disposing cost. Improving the utilization rate of the photoresist is one of the main objects of the coating process. Based on the self-developed 100 kHz ultrasonic nozzle, the film uniformity problem during the photoresist saving-oriented ultrasonic atomizing spraying process is studied. After analyzing the flow field distribution of carrier gas, a force and collision model is built to study behavioral characteristics of atomized droplets in rotating and symmetrical airflow field and then proposed a numerical simulation procedure to study transport processes of atomized droplets, which could analyze the impact of gas flow, fluid flow and spray cone cross-section height on atomized droplet’s particle size and concentration distribution effectively. The actual ultrasonic atomizing spraying experiment was carried out on 304.8 mm wafer using photoresist AZ4999. The results shows that the ultrasonic atomizing spraying nozzle can achieve high film uniformity and save about 80% photoresist when compared with spin coating process.

Key words: Droplet transport, Spray cone’s characteristics, Spraying process, Ultrasonic nozzle

中图分类号: