Halbach阵列与不同励磁方式的磁流变抛光特性及机理研究

doi:10.3901/JME.2023.15.341

机械工程学报 ›› 2023, Vol. 59 ›› Issue (15): 341-353.doi: 10.3901/JME.2023.15.341

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Halbach阵列与不同励磁方式的磁流变抛光特性及机理研究

郭源帆^1,2, 尹韶辉^1,2, 黄帅^1,2

1. 湖南大学国家高效磨削工程技术中心长沙 410082;
2. 湖南大学机械与运载工程学院长沙 410082

收稿日期:2022-09-09 修回日期:2023-04-16 出版日期:2023-08-05 发布日期:2023-09-27
通讯作者: 尹韶辉(通信作者),男,1967年出生,博士,教授,博士研究生导师。主要研究方向为纳米制造、超精密加工。E-mail:yinshaohui@hnu.edu.cn
作者简介:郭源帆,男,1988年出生,博士研究生。主要研究方向为纳米制造、超精密加工。E-mail:guoyuanfan@hnu.edu.cn;黄帅,男,1987年出生,副教授,硕士研究生导师。主要研究方向为超精密加工,仿生功能表面制备及应用。E-mail:huangshuai9228@126.com
基金资助:
国家自然科学基金(52075160、52130503)、国家重点研发计划(2017YFE0116900)和科技成果转化及产业化计划(2020GK2013)资助项目

Study on Machining Characteristic and its Mechanism of Magnetorheological Polishing with Halbach Array and Other Excitation Modes

GUO Yuanfan^1,2, YIN Shaohui^1,2, HUANG Shuai^1,2

1. National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082;
2. Mechanical and Vehicle Engineering College, Hunan University, Changsha 410082

Received:2022-09-09 Revised:2023-04-16 Online:2023-08-05 Published:2023-09-27

摘要/Abstract

摘要： 为提高平面磁流变抛光效率,首次提出了一种海尔贝克阵列励磁的平面磁流变抛光方法,并对比研究了不同励磁方式磁流变抛光系统的二维、三维磁场分布、磁性颗粒受力分布特性及其抛光性能,证明了海尔贝克阵列具有优良的励磁性能,可以实现高效平面磁流变抛光。对比试验描述了不同装置励磁下,磁流变抛光模形貌特征、抛光压力与痕迹分布、磁流变抛光性能、表面粗糙度与形貌随时间演变的规律,揭示了海尔贝克阵列励磁实现高效平面磁流变抛光的机理。抛光性能试验结果指出,使用N35牌号的钕铁硼永磁材料制造的海尔贝克阵列抛光K9光学玻璃,去除率可达到1.38 mm³/min,是直线气隙磁轭的4.4倍,是N-S极交替阵列的6.9倍。仅需30 min抛光,即可获得表面粗糙度小于Ra 1 nm的超光滑表面。海尔贝克阵列性能优异,配置灵活,大大提高了磁流变抛光的效率,对其他磁流变加工工艺和磁场辅助加工工艺具有借鉴意义。

关键词: 磁流变抛光液, 磁流变抛光, 海尔贝克阵列, 磁场, K9光学玻璃

Abstract: To improve the efficient of Magnetorheological polishing, in this work, A planar magnetorheological polishing method with Halbach array excitation is developed. The 2D and 3D magnetic field distribution and force distribution characteristics of magnetic particles of different excitation modes are compared. It is proved that Halbach array has excellent excitation performance, efficient planar magnetorheological polishing can be realized. The morphology characteristics, polishing pressure and mark distribution, magnetorheological polishing performance, surface roughness and morphology evolutions with time under different excitation modes are described by comparison experiments. The mechanism of efficient planar magnetorheological polishing by Halbach array excitation is revealed. The polishing performance results show the removal rate of K9 optic glass polished by N35 Halbach array can reach 1.38 mm³/min, which is 4.4 times of permanent yoke and 6.9 times of N-S array. The ultra-smooth surface with surface roughness less than Ra 1 nm can be obtained after 30 min polishing. The Halbach array has excellent performance and flexible configuration, which greatly improves the efficiency of magnetorheological polishing, and has reference significance for other magnetorheological processes and other magnetic field assisted machining processes.

Key words: magnetorheological polishing fluid, magnetorheological polishing, Halbach array, magnetic field, K9 optic glass

中图分类号:

TG356

郭源帆, 尹韶辉, 黄帅. Halbach阵列与不同励磁方式的磁流变抛光特性及机理研究[J]. 机械工程学报, 2023, 59(15): 341-353.

GUO Yuanfan, YIN Shaohui, HUANG Shuai. Study on Machining Characteristic and its Mechanism of Magnetorheological Polishing with Halbach Array and Other Excitation Modes[J]. Journal of Mechanical Engineering, 2023, 59(15): 341-353.

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Halbach阵列与不同励磁方式的磁流变抛光特性及机理研究

Study on Machining Characteristic and its Mechanism of Magnetorheological Polishing with Halbach Array and Other Excitation Modes

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