• CN:11-2187/TH
  • ISSN:0577-6686

›› 2009, Vol. 45 ›› Issue (4): 187-191.

• 论文 • 上一篇    下一篇

基于原子力显微镜的四电极微探针局域电导率测量技术

居冰峰;巨阳;坂真澄   

  1. 浙江大学流体传动及控制国家重点实验室;名古屋大学机械理工学专攻;东北大学纳米力学专攻
  • 发布日期:2009-04-15

Prototype Atomic Force Microscope System with Micro-four-point Probe for Quantitative Characterization of Local Electrical Conductivity

JU Bingfeng;JU Yang;SAKA Masumi   

  1. The State Key Lab of Fluid Power Transmission and Control, Zhejiang University Department of Mechanical Science and Engineering, Nagoya University Department of Nanomechanics, Tohoku University
  • Published:2009-04-15

摘要: 开发了基于原子力显微镜(Atomic force microscope,AFM)的四电极微探针局域电导率测量技术。四电极AFM探针最小的电极间距为300 nm,安装了这种新型四电极微探针的AFM系统既保持表面微观形貌测量能力,又可以在实施表面形貌扫描的同时测定局域电导率。利用该技术精确测量了厚度为6.0 m的铝薄膜和厚度为350 nm的透明导电氧化铟薄膜(Indium tin oxide,ITO)的局域电导率,试验结果证明基于AFM的四电极微探针技术在亚微米局域电导率测量方面的能力。

关键词: 导电薄膜, 局域电导率, 四电极方法, 原子力显微镜

Abstract: An atomic force microscope probe for local conductivity measurement is presented. The minimum space of the four-point atomic force microscope (AFM) probe is 300 nm. The AFM system with the newly developed four-point probe not only inherits the function of AFM surface topography generating but also has the capability of characterizing the local conductivity simultaneously. The local conductivities of aluminum and indium tin oxide thin films of 6.0 m and 350 nm thick are quantitatively measured respectively. The conductivity measurements indicate this four-point AFM probe technique has the capability of measuring submicrometer electrical conductivity.

Key words: Atomic force microscope, Conductive thin film, Four-point probe method, Local electrical conductivity

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