先进装备表面磁控溅射技术复合防护体系研究进展

doi:10.3901/JME.2025.10.036

摘要/Abstract

摘要： 随着科技的发展，先进装备表面防护问题日益突出，尤其针对高精尖零部件表面的防护技术研究更是困扰众多研究人员的关键科学问题之一。现如今众多技术进步都依赖于创造具有增强性能的新型复合材料，其中磁控溅射技术由于对材料表面适配性强，元素选择多样，对于各类先进装备表面防护薄膜制备提供一个新的控制维度。因此，为进一步总结先进装备内部高精尖零部件防护需求，致力于改善装备表面防护难题，综述了磁控溅射薄膜沉积技术的最新进展，一方面，针对磁控溅射薄膜沉积过程变化机理、形成机制进行综述，明确靶材溅射对基体材料的性能影响，进一步分析时空间维度上薄膜沉积的可靠性；另一方面，详细论述各类装备表面防护薄膜的应用特色及成形行为。最后，结合磁控溅射镀膜技术的工艺特性，对磁控溅射薄膜沉积过程中的通量特征进行深入分析，并探讨影响薄膜沉积状态的微观结构、表面特性等因素。综上，本文总结先进装备表面磁控溅射镀膜技术的应用机理，并从磁控溅射镀膜组织结构、力学性能、服役性能的角度出发，结合磁控溅射镀膜技术的典型应用，综述了磁控溅射镀膜技术的发展趋势，以及对应用前景的优势和存在问题进行总结，并对磁控溅射镀膜技术的未来先进薄膜体系进行评估和展望。

关键词: 先进装备, 磁控溅射, 薄膜防护

Abstract: With the development of science and technology, the issue of surface protection for advanced equipment has become increasingly prominent, especially the research on surface protection technology for high-precision and high-performance components, which is one of the key scientific problems that has long troubled many researchers. Nowadays, many technological advancements rely on creating new composite materials with enhanced performance. Among them, magnetron sputtering technology, due to its strong adaptability to material surfaces and diverse element selection, provides a new control dimension for the preparation of surface protection films for various advanced equipment. Therefore, to further summarize the protection requirements of high-precision and advanced components inside advanced equipment and to address the challenges of surface protection of equipment, this study reviews the latest progress in magnetron sputtering thin film deposition technology. On the one hand, it reviews the variation mechanism and formation mechanism of the magnetron sputtering thin film deposition process, clarifies the influence of target sputtering on the performance of substrate materials, and further analyzes the reliability of thin film deposition in the time and space dimensions. On the other hand, it elaborates on the application characteristics and formation behavior of various surface protection films for equipment. Finally, in light of the technological attributes of magnetron sputtering coating, a thorough analysis of the flux features during the magnetron sputtering film deposition process is conducted, and the factors influencing the film deposition state, such as microstructure and surface properties, are explored. This paper summarizes the application mechanism of advanced equipment surface magnetron sputtering coating technology. Starting from the perspectives of the microstructure, mechanical properties, and service performance of magnetron sputtering coatings, and in combination with typical applications of magnetron sputtering coating technology, the development trends of magnetron sputtering coating technology are reviewed. The advantages and existing problems of its application prospects are summarized, and an assessment and outlook on the future advanced film systems of magnetron sputtering coating technology are provided.

Key words: advanced equipment, magnetron sputtering, film protection

中图分类号:

TB302

赵立存, 王志远, 刘洋, 姜巍, 刘金娜. 先进装备表面磁控溅射技术复合防护体系研究进展[J]. 机械工程学报, 2025, 61(10): 36-65.

ZHAO Licun, WANG Zhiyuan, LIU Yang, JIANG Wei, LIU Jinna. Research Progress on Composite Protection of Advanced Equipment Surfaces Using Magnetron Sputtering Technology[J]. Journal of Mechanical Engineering, 2025, 61(10): 36-65.

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