• CN:11-2187/TH
  • ISSN:0577-6686

›› 1992, Vol. 28 ›› Issue (2): 48-52.

• 论文 • 上一篇    下一篇

离子束增强沉积薄膜的摩擦磨损行为与结构分析

孙学良;冯雪飞;常明;金祖卿;许守廉;柳襄怀;郑志宏   

  1. 天津大学机电分校;上海冶金研究所
  • 发布日期:1992-03-01

BEHAVIOR OF FRICTION AND WEAR AND MICROSTRUCTURE OF FILMS SYNTHESIZED BY ION BEM ENHANCED DEPOSITION

Sun Xueliang;Feng Xuefei;Chang Ming;Jin Zuqing;Xu Shoulian;Liu Xianghuai;Zheng Zhihong   

  1. The Mechanical and Electrical College Under Tianjin University Shanghai Institute of Metallurgy
  • Published:1992-03-01

摘要: 采用离子束增强沉积(IBED)技术在不锈钢1Cr18Ni9Ti衬底表面生长氮化钛薄膜以及氮离子注入,进行了干滑动摩擦磨损试验与组织结构电镜分析,表明增强沉积膜较离子注入具有更高耐磨性能。

关键词: 沉积, 离子束, 摩擦磨损

Abstract: Silicon nitride and titanium nitride films have been synthesized by concurrent electron beam evaporation of silicon or titanium and bombardent with nitrogen ions on 1Cr18Ni9Ti plate. And nitride ions have been implanted on the same substrate. The friction and wear were investigated. Microstructure of silicon nitride film were analysed be TEM and x-Ray diffraction. The results showed that silicon nitride and titanium nitride films have better properties of friction and wear than nitride ions implantation.

Key words: 沉积, 离子束, 摩擦磨损