蓝宝石基片的磁流变化学抛光试验研究

doi:10.3901/JME.2016.05.080

机械工程学报 ›› 2016, Vol. 52 ›› Issue (5): 80-87.doi: 10.3901/JME.2016.05.080

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蓝宝石基片的磁流变化学抛光试验研究

尹韶辉¹, 王永强¹, 李叶鹏¹, 康仁科², 陈逢军¹, 胡天³

1. 湖南大学国家高效磨削工程技术研究中心长沙 410082;
2. 大连理工大学精密与特种加工教育部重点实验室大连 116024;
3. 长沙纳美特超精密制造技术有限公司长沙 430100

出版日期:2016-03-05 发布日期:2016-03-05
作者简介:尹韶辉,男,1967年出生,博士,教授,博士研究生导师。主要研究方向为超精密加工与纳米制造。E-mail：yinshaohui@hnu.edu.cn;王永强(通信作者),男,1979年出生,博士研究生,讲师。主要研究方向为磁场辅助超精密加工。E-mail：rancher_wong@126.com
基金资助:
国家自然科学基金(51205120)、国际科技合作与交流专项(2014DFG72480)和大连理工大学精密与特种加工教育部重点实验室开放基金资助项目

Experimental Study on Magnetorheological Chemical Polishing for Sapphire Substrate

YIN Shaohui¹, WANG Yongqiang¹, LI Yepeng¹, KANG Renke², CHEN Fengjun¹, HU Tian³

1. National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082;
2. Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024;
3. Changsha Nano-meter Ultra-precision Manufacturing Technology Co., Ltd., Changsha 430100

Online:2016-03-05 Published:2016-03-05

摘要/Abstract

摘要： 分析了磁流变化学抛光的加工机理,对蓝宝石基片的磁流变化学抛光进行了试验研究。结果表明：磁流变化学抛光可将蓝宝石基片加工到亚纳米级粗糙度的超光滑镜面,材料去除率受化学反应速率和剪切去除作用共同影响,化学反应速率越快,剪切去除作用越强,材料去除率越高;混有硅胶溶液与α-Al₂O₃磨料的磁流变化学抛光液去除率最高;材料去除率随工作间隙,励磁间隙以及加工时间的增大而减少,随铁粉浓度减少而减少;利用磁流变化学抛光方法加工蓝宝石基片可获得R_a 0.3 nm的超光滑表面。

关键词: 材料去除率, 超光滑镜面, 磁流变化学抛光, 蓝宝石基片

Abstract: Machining mechanism of magnetorheological chemical polishing is analyzed. Polishing experiments are conducted for sapphire substrate. The results show that magnetorheological chemical polishing sapphire substrate can be processed to sub-nanometer roughness ultra smooth mirror, the material removal rate is affected by the chemical reaction rate and shear action to remove the chemical reaction rate is faster, the stronger the shear removed, material removal rate is higher;higher removal rate is obtained when the magnetorheological chemical fluid which contains colloidal silica and α-Al₂O₃ abrasive is used as polishing slurry. The material removal rate decreases with the increase in work gap, excitation gap and polishing time, but with the decrease in particle concentrations. Ultra-smooth surface of 0.3 nm in R_ais achieved by using magnetorheological chemical polishing.

Key words: magnetorheological chemical polishing, material removal rate, sapphire substrate, ultra-smooth mirror surface

中图分类号:

TH161

尹韶辉, 王永强, 李叶鹏, 康仁科, 陈逢军, 胡天. 蓝宝石基片的磁流变化学抛光试验研究[J]. 机械工程学报, 2016, 52(5): 80-87.

YIN Shaohui, WANG Yongqiang, LI Yepeng, KANG Renke, CHEN Fengjun, HU Tian. Experimental Study on Magnetorheological Chemical Polishing for Sapphire Substrate[J]. Journal of Mechanical Engineering, 2016, 52(5): 80-87.

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链接本文: http://www.cjmenet.com.cn/CN/10.3901/JME.2016.05.080

http://www.cjmenet.com.cn/CN/Y2016/V52/I5/80

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蓝宝石基片的磁流变化学抛光试验研究

Experimental Study on Magnetorheological Chemical Polishing for Sapphire Substrate

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