关键词: CrN膜, TiN膜, α-C：H膜, 多弧离子镀, 离子束技术

Abstract: Cr/α-C：H films system are prepared by unbalanced magnetron sputtering and anode ion beam technique, and Cr/CrNx and Ti/TiNx films systems are prepared by multi-arc ion plating technique. The thicknesses of films are 2 µm. The microstructures and the morphologies of the resulting of three films systems are investigated by scanning electron microscopy, atomic force microscopy, Raman spectroscopy and X-ray diffractometer, respectively. The mechanical and the tribological properties of the films are studied by WS-2005 scratch tester, and ball cratering tester. The results show that α-C：H films prepared by anode ion beam technique are films with non-crystal structure and smooth surface, the roughness value is only 5.21 nm, highest critical load is 17.8 N in scratch test, while the roughness value of crystal Ti/TiNx films systems are higher, and there’s droplet on the surface, but the adhesive strength of Ti/TiNx and Cr/CrNx films to the substrate are higher, and the highest critical load is up to more than 80 N in scratch test. The tribological properties of α-C：H film is better than TiNx and CrNx films. The unit wear rate of films to the substrate of YG6 cemented carbide is lower than the films to the substrate of SKD11 stainless steel.

Key words: Arc ion Plating, CrN film, Ion beam technique, TiN film, α-C：H film