关键词: 集成电路　微电子机械　快速复型　光刻

Abstract: Rapid precision manufacturing for 0.1 μm or finer feature sizes lithography in integrated circuit or micro electro mechanical systems precision manufacturing is discussed. This technique avoids the conflict between lithography speed and feather size. As same as electron-beam lithography and imprint lithography, it not only has the same ability of nano-meter manufacturing, but also overcomes their shortcomings. At last, it can make low cost and precise manufacturing on large area at high speed.

Key words: IC, Lithography, MEMS, Rapid reputation