• CN: 11-2187/TH
  • ISSN: 0577-6686

›› 1991, Vol. 27 ›› Issue (1): 72-76.

• Article • Previous Articles     Next Articles

ANALYSES OF THE MICROSTRUCTURES OF Si3N4 FILM BY ION BEAM ENHANCED DEPOSITION

Jin Zuqing;Chang Ming;Xu Shoulian;Liu Xianghuai;Zheng Shihong   

  1. The Mechanical & Electrical College under Tianjin University Shanghai Institute of Metallurgy
  • Published:1991-01-01

Abstract: TEM, SEM and x-ray have been used to investigate the microstructures of the silicon nitride film by Ion Beam Enhanced Deposition (IBED) on surface of 1 Cr18Ni9Ti. Observation reveals that Si3N4 is the amorphous structure and have been a little dispersed single crystal phase β–Si3N4 in the film. The physiognomy of Si3N4, interface shape of Si3N4/1Cr18Ni8Ti and the factors influence on the formation were discussed gualilatively in the paper.

Key words: 沉积, 离子束, 显微组织