• CN: 11-2187/TH
  • ISSN: 0577-6686

›› 2000, Vol. 36 ›› Issue (3): 107-110.

• Article • Previous Articles    

ON THE CHARACTERISTICS OF Si MICRO-FABRICATION BY DIRECT ETCHING OF EXCIMER LASER

Yuan Weizheng;Ma Binghe;Li Xiaoying;Li Tiejun;Wang Lige;Liu Jingru   

  1. Northwestern Polytechnical University Northwest Institute of Nuclear Technology
  • Published:2000-03-15

Abstract: The characteristics of Si micro-fabrication for MEMS by direct etching of DrF excimer laser, such as the machined topography, heat situation and thermal affecting zone are studied based on experiment. The duality empirical formula which can refled the relationship between etching depth and number of pulses, laser energy is obtained and then analyzed.

Key words: Directetching, Excimer laser, Si micro-fabrication

CLC Number: