Abstract: Immersion lithography is the only actual applied technology for up to 45-mm IC production line . The high refractive index liquid filled between the last one projective lens and wafer is used to improve the optical resolution of the immersion lithography, but the photoresist leaching and liquid heating can occur during immersion exposure process. The liquid renovation must be considered in the immersion lithography because of its ability of pollution elimination and heat dispersion. A CFD model is established to study the influence of structural parameters on the updating efficiency of immersion flow field. The visual flow field test system composed of high-speed camera and data acquisition instrument is used to carry out the research of visualization of immersion flow field, and which is compared with the simulation result, thereby a set of optimized parameters of injection and recovery ports is obtained.

Key words: Flow visualization, Immersion flow field, Immersion lithography, Updating efficiency