300 mm晶圆化学机械抛光机关键技术研究与实现

王同庆;路新春;赵德文;门延武;何永勇

Research and Implementation on Critical Technology of Chemical Mechanical Polishing Tool for 300 mm Wafer

WANG Tongqing;LU Xinchun;ZHAO Dewen;MEN Yanwu;HE Yongyong

. 2014, (5): 182 -187 .