BEHAVIOR OF FRICTION AND WEAR AND MICROSTRUCTURE OF FILMS SYNTHESIZED BY ION BEM ENHANCED DEPOSITION

›› 1992, Vol. 28 ›› Issue (2): 48-52.

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BEHAVIOR OF FRICTION AND WEAR AND MICROSTRUCTURE OF FILMS SYNTHESIZED BY ION BEM ENHANCED DEPOSITION

Sun Xueliang;Feng Xuefei;Chang Ming;Jin Zuqing;Xu Shoulian;Liu Xianghuai;Zheng Zhihong

The Mechanical and Electrical College Under Tianjin University Shanghai Institute of Metallurgy

Published:1992-03-01

Abstract

Abstract: Silicon nitride and titanium nitride films have been synthesized by concurrent electron beam evaporation of silicon or titanium and bombardent with nitrogen ions on 1Cr18Ni9Ti plate. And nitride ions have been implanted on the same substrate. The friction and wear were investigated. Microstructure of silicon nitride film were analysed be TEM and x-Ray diffraction. The results showed that silicon nitride and titanium nitride films have better properties of friction and wear than nitride ions implantation.

Key words: 沉积, 离子束, 摩擦磨损

Sun Xueliang;Feng Xuefei;Chang Ming;Jin Zuqing;Xu Shoulian;Liu Xianghuai;Zheng Zhihong. BEHAVIOR OF FRICTION AND WEAR AND MICROSTRUCTURE OF FILMS SYNTHESIZED BY ION BEM ENHANCED DEPOSITION[J]. , 1992, 28(2): 48-52.

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BEHAVIOR OF FRICTION AND WEAR AND MICROSTRUCTURE OF FILMS SYNTHESIZED BY ION BEM ENHANCED DEPOSITION

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