Abstract: To obtain micro-pits array which can reduce friction and wear of friction pairs, an electrochemical machining method with a mask onto the cathode is proposed to produce the micro-pit array patterns. Finite element simulation of the method is carried out to analyze the effect of the photoresist thickness on the pit size and shape. The experiments of micro-ECM are done to analyze the effect of frequency and duty cycle on the diameter of micro-pits, in which the cathode plate with the hole diameter of 100 μm is produced by using lithography method. The experimenter’s result reveals that the micro-pits with the diameter of 200 μm and the depth of 10 μm can be obtained in electrochemical machining method with a mask onto the cathode.

Key words: Array micro-pits, Micro-ECM, Photoresist