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CN: 11-2187/TH
ISSN: 0577-6686
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JME College
中文
Simulation and Experimental Study on Photoresist Flow and Deforming Behavior in Imprint Lithography Process
WANG Quandai;DUAN Yugang;LU Bingheng;LI Dichen;XIANG Jiawei
. 2010, (
3
): 165 -171 .
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